Novel nonlithographic Quantum Wire Array Fabrication

Authors

Biswajit Das, University of Nevada, Las VegasFollow
Pavan Singaraju, University of Nevada, Las Vegas

Document Type

Article

Publication Date

2-2007

Publication Title

Physica E: Low-Dimensional Systems and Nanostructures

Volume

36

Issue

2

First page number:

133

Last page number:

139

Abstract

We have developed a novel nonlithographic technique for the fabrication of large arrays of quantum wires with complex layered structures that will find applications in many fields. The technique is based on an image reversal process to form an array of tantalum oxide nano-pillars that are used as masks for the etching of epitaxially grown semiconductor layers on an arbitrary substrate. This technique can be used to form quantum wires of complex layered structures that are essential for most practical applications. We have developed the technology to create quantum wires of silicon, however, the technique can be extended to any other material system.

Keywords

Heterostructures; Nanowires; Tantalum oxides

Disciplines

Electrical and Computer Engineering | Electrical and Electronics | Engineering

Language

English

Permissions

Use Find in Your Library, contact the author, or interlibrary loan to garner a copy of the item. Publisher policy does not allow archiving the final published version. If a post-print (author's peer-reviewed manuscript) is allowed and available, or publisher policy changes, the item will be deposited

Repository Citation

Das, B., Singaraju, P. (2007). Novel nonlithographic Quantum Wire Array Fabrication. Physica E: Low-Dimensional Systems and Nanostructures, 36(2), 133-139.