Document Type
Article
Publication Date
11-1998
Publication Title
Review of Scientific Instruments
Publisher
American Institute of Physics
Volume
69
Issue
11
First page number:
3809
Last page number:
3817
Abstract
A gas-phase time-of-flight (TOF) apparatus, capable of supporting as many as six electron-TOF analyzers viewing the same interaction region, has been developed to measure energy- and angle-resolved electrons with kinetic energies up to 5 keV. Each analyzer includes a newly designed lens system that can retard electrons to about 2% of their initial kinetic energy without significant loss of transmission; the analyzers can thus achieve a resolving power (E/ΔE) greater than 104 over a wide kinetic-energy range. Such high resolving power is comparable to the photon energy resolution of state-of-the-art synchrotron–radiation beamlines in the soft x-ray range, opening the TOF technique to numerous high-resolution applications. In addition, the angular placement of the analyzers, by design, permits detailed studies of nondipolar angular distribution effects in gas-phase photoemission.
Controlled Subject
Demodulation (Electronics); Photoelectron spectroscopy; Synchrotron radiation; Time-of-flight mass spectrometry
Disciplines
Atomic, Molecular and Optical Physics | Physical Chemistry
File Format
File Size
705 KB
Language
English
Permissions
Copyright (1998) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
Rights
IN COPYRIGHT. For more information about this rights statement, please visit http://rightsstatements.org/vocab/InC/1.0/
Repository Citation
Hemmers, O.,
Whitfield, S. B.,
Glans, P.,
Wang, H.,
Lindle, D. W.,
Wehlitz, R.,
Sellin, I. A.
(1998).
High-Resolution Electron Time-of-Flight Apparatus for the Soft-X-Ray Region.
Review of Scientific Instruments, 69(11),
3809-3817.
https://digitalscholarship.unlv.edu/hrc_fac_articles/38
Comments
Also published in:
Advanced Light Source Compendium of User Abstracts and Technical Reports 1998, August 1999