Award Date

5-2009

Degree Type

Thesis

Degree Name

Master of Science in Electrical Engineering (MSEE)

Department

Electrical and Computer Engineering

First Committee Member

Biswajit Das, Chair

Second Committee Member

Yingtao Jiang

Third Committee Member

Mei Yang

Graduate Faculty Representative

Laxmi Gewali

Number of Pages

87

Abstract

Nanoporous anodic aluminum oxide has traditionally been made in one of two ways: "Mild Anodization (MA)" or "Hard Anodization (HA)". The former method produces self-ordered pore structures but it is slow and only works for a narrow range of processing conditions; the latter method, which is widely used in the aluminum industry, is faster but it produces films with disordered pore structures. Here we report a novel approach termed "pulse anodization" that combines the advantages of the MA and HA processes. By designing the pulse sequences it is possible to control both the composition and pore structure of the anodic aluminum oxide films while maintaining high throughput.

Keywords

Aluminum—Anodic oxidation; Metals--Anodic oxidation; Nanotechnology; Thin films

Disciplines

Electrical and Computer Engineering | Materials Science and Engineering | Mechanical Engineering | Nanoscience and Nanotechnology

Language

English

Comments

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