Master of Science (MS)
Electrical and Computer Engineering
First Committee Member
Number of Pages
The antidot system is an interesting material for applications in GMR (Giant Magnetoresistance) device technology. Such devices have been the subject of investigation for its physics during the past fifteen years; however there has not been any focus towards application in GMR technology. The objective of this thesis is to develop a optimum device configuration as well as process technology for GMR applications of antidot structures. This thesis describes two different non-lithographic techniques for the fabrication of nickel based antidot systems. The first technique uses an alumina template as a mask to etch holes on the underneath nickel. Preliminary data show a 100 % change in magnetoresistance at room temperature at very low magnetic fields, making it highly suitable for device applications. However, the kilo-ohm change in magnetoresistance in this device also suggests that the material no longer consists of a simple nickel layer with holes but could have formed a complex alloy. The second technique involves the electron beam evaporation of nickel on an alumina template. Nickel antidot systems with three different hole dimensions were implemented using this technique. FESEM images show a periodic arrangement of pores on the nickel surface.
Antidot; Applications; Based; Device; Fabrication Lithographic; Nickel; Potential; System
University of Nevada, Las Vegas
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Mookerjea, Saurabh Amitabha, "Non-lithographic fabrication of nickel based antidot system for potential Gmr device applications" (2005). UNLV Retrospective Theses & Dissertations. 1889.
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