Influence of Growth Conditions on the As Antisites, As(Ga)o and As(Ga)+ Concentrations in the Low Temperature GaAs MBE Growth: A First Theoretical Study

Document Type

Conference Proceeding

Publication Date

1998

Publication Title

Proceedings of the 10th Conference on Semiconducting and Insulating Materials

Publisher

Institute of Electrical and Electronics Engineers

First page number:

109

Last page number:

112

Abstract

A novel theoretical investigation is employed to study the influence of surface dynamics in low temperature MBE growth of GaAs. A kinetic growth model along with the charge neutrality equation is used to find the distribution of As antisites between the neutral and charged species using the bulk Ga vacancy concentrations obtained from simulations for the first time. The experimentally observed temperature and as flux dependencies of the As antisite concentrations are successfully reproduced by the model. The As(Ga)(0) and As(Ga)(+) concentrations saturate with As flux for a given temperature due to saturation of an amorphous, physisorbed As surface layer which acts as the reservoir for As antisite incorporation. The As antisite concentration saturates at lower value for higher temperature due to larger evaporation of As antisite from the crystalline state. It is observed that both AsGa(0) and As(Ga)(+) concentrations decrease with increase in temperature. While the decrease of As(Ga)(0) concentration with temperature is related to the direct evaporation of As antisite from the crystalline state, the decrease of As(Ga)(+) is related to a decrease in the Ga vacancy concentration

Keywords

Crystal growth; Crystals at low temperatures; Gallium arsenide; Molecular beam epitaxy; Semiconductors

Permissions

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