Application of a novel plasma-based advanced oxidation process for efficient and cost-effective destruction of refractory organics in tertiary effluents and contaminated groundwater
Document Type
Article
Publication Date
2009
Publication Title
Desalination and Water Treatment
Volume
11
First page number:
236
Last page number:
244
Abstract
Corona discharge is emerging as a promising advanced oxidation process (AOP) for the treatment of a variety of organic contaminants, including compounds that are not effectively destroyed by more common AOPs. This paper presents laboratory and field results describing the destruction of regulated and Contaminant Candidate List (CCL) compounds in tertiary treated wastewater effluent and contaminated groundwater during the operation of a novel hydro-non-thermal-plasma (HNTP) AOP system. The system generates a plasma discharge above the target water matrix, which emits an “electron wind”, ultraviolet (UV) irradiation, O3(g) and hydroxyl radicals (•OH) into a relatively thin water layer. The synergism between these oxidizing agents results in efficient degradation of refractory organics (typically >95%) rendering further chemical dosage unnecessary. Batch experiments revealed the dominating kinetics to be first order for MTBE (k = 7.5×10−4 s−1) and TCE (k = 4.8×10−4 s−1). This study is the first report of pilot-scale HNTP destruction of (mainly) TCE, 1,4-dioxane and NDMA from a contaminated water source (groundwater in California). The pilot-scale HNTP reactor showed high removal efficiencies of 95.3%, 91.7% and 95.3%, for these three contaminants, along with energy efficiency (EEO) values comparable to other AOP systems.
Keywords
Advanced oxidation process (AOP); Butyl methyl ether (MTBE); Dimethylnitrosamine (NDMA); Irradiation; Non-thermal plasma; Organic water pollutants; Trichloroethylene (TCE); Water — Purification; Water — Purification — Ultraviolet treatment
Disciplines
Environmental Engineering | Environmental Health and Protection | Environmental Sciences | Organic Chemistry | Water Resource Management
Language
English
Permissions
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Repository Citation
Even-Ezra, I.,
Mizrahi, A.,
Gerrity, D.,
Snyder, S. A.,
Salveson, A.,
Lahav, O.
(2009).
Application of a novel plasma-based advanced oxidation process for efficient and cost-effective destruction of refractory organics in tertiary effluents and contaminated groundwater.
Desalination and Water Treatment, 11
236-244.
http://dx.doi.org/10.5004/dwt.2009.808