Award Date
5-2009
Degree Type
Thesis
Degree Name
Master of Science in Electrical Engineering (MSEE)
Department
Electrical and Computer Engineering
First Committee Member
Biswajit Das, Chair
Second Committee Member
Yingtao Jiang
Third Committee Member
Mei Yang
Graduate Faculty Representative
Laxmi Gewali
Number of Pages
87
Abstract
Nanoporous anodic aluminum oxide has traditionally been made in one of two ways: "Mild Anodization (MA)" or "Hard Anodization (HA)". The former method produces self-ordered pore structures but it is slow and only works for a narrow range of processing conditions; the latter method, which is widely used in the aluminum industry, is faster but it produces films with disordered pore structures. Here we report a novel approach termed "pulse anodization" that combines the advantages of the MA and HA processes. By designing the pulse sequences it is possible to control both the composition and pore structure of the anodic aluminum oxide films while maintaining high throughput.
Keywords
Aluminum—Anodic oxidation; Metals--Anodic oxidation; Nanotechnology; Thin films
Disciplines
Electrical and Computer Engineering | Materials Science and Engineering | Mechanical Engineering | Nanoscience and Nanotechnology
File Format
Degree Grantor
University of Nevada, Las Vegas
Language
English
Repository Citation
Gunukula, Mahesh Babu, "Modulated nanopores using pulse anodization on thin aluminum" (2009). UNLV Theses, Dissertations, Professional Papers, and Capstones. 1180.
http://dx.doi.org/10.34917/2596330
Rights
IN COPYRIGHT. For more information about this rights statement, please visit http://rightsstatements.org/vocab/InC/1.0/
Included in
Electrical and Computer Engineering Commons, Materials Science and Engineering Commons, Mechanical Engineering Commons, Nanoscience and Nanotechnology Commons
Comments
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