Emerging investigators series: Prediction of trace organic contaminant abatement with UV/H2O2: Development and validation of semi-empirical models for municipal wastewater effluents
Document Type
Article
Publication Date
1-1-2016
Publication Title
Environmental Science: Water Research and Technology
Volume
2
Issue
3
First page number:
460
Last page number:
473
Abstract
Recent evaluations of potable reuse treatment trains suggest that the use of UV and UV/H2O2 may become increasingly common, particularly in systems employing ozone and/or biofiltration. This study provides a summary of photolysis rate constants and OH rate constants and demonstrates the applicability of semiempirical relationships predicting OH exposure and trace organic contaminant (TOrC) abatement with UV/ H2O2 in matrices with low UV transmittance (e.g., <80%). The data are based on bench-scale experiments with 17 target compounds in 10 laboratory-filtered secondary wastewater effluents. As an alternative to OH exposure measurements with probe compounds, three different approaches for considering the impacts of matrix-specific OH scavenging on TOrC abatement are proposed: (1) estimation of ROH,UV (i.e., OH exposure per UV dose); (2) estimation of kUV/DOC, the pseudo first order rate constant based on the UV/DOC (dissolved organic carbon) ratio; and (3) assessment of TOrC abatement based on differential UV254 absorbance or fluorescence. The level of laboratory investment varies with each approach, but there is a tradeoff in the accuracy of the predictions and whether they typically overestimate or underestimate actual TOrC abatement. © The Royal Society of Chemistry 2016.
Language
English
Repository Citation
Gerrity, D.,
Lee, Y.,
Gamage, S.,
Lee, M.,
Pisarenko, A. N.,
Trenholm, R. A.,
Von Guntene, U.,
Snyder, S. A.
(2016).
Emerging investigators series: Prediction of trace organic contaminant abatement with UV/H2O2: Development and validation of semi-empirical models for municipal wastewater effluents.
Environmental Science: Water Research and Technology, 2(3),
460-473.
http://dx.doi.org/10.1039/c6ew00051g